Art
J-GLOBAL ID：200902041327420801   Reference number：86A0256604

A microprocessor controlled, dry pumped, high-vacuum coating system for thick film depositions.

厚膜たい積用のマイクロプロセッサ制御・ドライポンプ方式の高真空蒸着装置
Author (1)：
NESSLAGE G V

About NESSLAGE G V

(Monsanto Research Corp., Ohio)

About Monsanto Research Corp., Ohio


Material：
Solid State Technology  (Solid State Technol)

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Volume： 25  Issue： 4  Page： 136-138  Publication year： Apr. 1982 
JST Material Number： E0226A  ISSN： 0038-111X  Document type： Article
Article type： 解説  Country of issue： United States (USA)  Language： ENGLISH (EN)
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thick film technique

About thick film technique

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
厚膜

About 厚膜

, 
たい積

About たい積

, 
マイクロプロセッサ

About マイクロプロセッサ

, 
高真空

About 高真空

, 
蒸着装置

About 蒸着装置


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