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J-GLOBAL ID:200902043244663349   Reference number:90A0366203

Kinetics of low-pressure chemical vapor deposition of TiO2 from titanium tetraisopropoxide.

チタンテトライソプロポキシドからのTiO2低圧化学蒸着速度
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Material:
Volume: 137  Issue:Page: 814-818  Publication year: Mar. 1990 
JST Material Number: C0285A  ISSN: 1945-7111  CODEN: JESOAN  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Oxide thin films 
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