Art
J-GLOBAL ID：200902043244663349   Reference number：90A0366203

Kinetics of low-pressure chemical vapor deposition of TiO2 from titanium tetraisopropoxide.

チタンテトライソプロポキシドからのTiO2低圧化学蒸着速度
Author (2)：
SIEFERING K L

About SIEFERING K L

(Univ. Minnesota, Minnesota)

About Univ. Minnesota, Minnesota

, 
GRIFFIN G L

About GRIFFIN G L

(Univ. Minnesota, Minnesota)

About Univ. Minnesota, Minnesota


Material：
Journal of the Electrochemical Society  (J Electrochem Soc)

About Journal of the Electrochemical Society


Volume： 137  Issue： 3  Page： 814-818  Publication year： Mar. 1990 
JST Material Number： C0285A  ISSN： 1945-7111  CODEN： JESOAN  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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titanium oxide

About titanium oxide

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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isopropyl alcohol

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JST classification (1)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
チタンテトライソプロポキシド

About チタンテトライソプロポキシド

, 
TiO2

About TiO2

, 
低圧化学蒸着

About 低圧化学蒸着


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