Art
J-GLOBAL ID：200902048674643971
Reference number：91A0154646
Low-temperature in situ surface cleaning of oxide-patterned wafers by Ar/H2 plasma sputter.
酸化物でパターンを描いたウエハのAr/H2プラズマスパッタによる低温においたままの表面清浄化
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Author (2)：
,
Material：
Volume：
68
Issue：
9
Page：
4681-4693
Publication year：
Nov. 01, 1990
JST Material Number：
C0266A
ISSN：
0021-8979
CODEN：
JAPIAU
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (3)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films
, Applications of plasma
, Manufacturing technology of solid-state devices
Terms in the title (8)：
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