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J-GLOBAL ID：200902048835342616   Reference number：83A0301197

イオンビーム法による薄膜形成

Author (1)：
TAKAGI TOSHINORI

About TAKAGI TOSHINORI

(京大工)

About 京大工


Material：
化学と工業  (Chemistry & Chemical Industry)

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Volume： 35  Issue： 12  Page： 848-851  Publication year： Dec. 1982 
JST Material Number： F0107A  ISSN： 0022-7684  CODEN： KAKTAF  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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thin film growth

About thin film growth

,...
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JST classification (2)：
JST classification
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Techniques and equipment of thin film deposition 
(BK14020I)

About Techniques and equipment of thin film deposition

,  Applications of electron beams and ion beams 
(BD02070X)

About Applications of electron beams and ion beams

Terms in the title (2)：
Terms in the title
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イオンビーム

About イオンビーム

, 
薄膜形成

About 薄膜形成


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