Reactive Planar Magnetron Sputtering System with Obliquely Facing Targets of Zn.

TOMINAGA K; SHIRAI M; IMAI H

Art

J-GLOBAL ID：200902049238042624 Reference number：91A0905121

Reactive Planar Magnetron Sputtering System with Obliquely Facing Targets of Zn.

Znの傾斜ターゲットを使った反応性プレーナマグネトロンスパッタリングシステム

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Author (3)： , ,
Material：
Volume： 30 Issue： 9B Page： 2216-2219 Publication year： Sep. 1991
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Techniques and equipment of thin film deposition , Oxide thin films

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