The research on the mechanochemical polishing of a Si wafer.(1).Processing characteristics by BaCO<sub>3</sub> grit.

HATTA KEN'ICHI; YASUNAGA NOBUO

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J-GLOBAL ID：200902055847463890 Reference number：90A0920070

The research on the mechanochemical polishing of a Si wafer.(1).Processing characteristics by BaCO₃ grit.

Siウェハのメカノケミカルポリシングに関する研究 (1) BaCO₃砥粒による加工特性

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Volume： 1990 Issue： Autumn 1 Page： 315-316 Publication year： Sep. 1990
JST Material Number： Y0914A Document type： Proceedings
Article type：短報 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Manufacturing technology of solid-state devices

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The research on the mechanochemical polishing of a Si wafer.(1).Processing characteristics by BaCO3 grit.

The research on the mechanochemical polishing of a Si wafer.(1).Processing characteristics by BaCO₃ grit.