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J-GLOBAL ID:200902056334237335   Reference number:86A0094925

Highly accumulated electron layer at a semiconductor/electrolyte interface.

半導体/電解質界面における高密度電子蓄積層
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Volume: 32  Issue:Page: 2439-2448  Publication year: Aug. 15, 1985 
JST Material Number: D0746A  ISSN: 1098-0121  CODEN: PRBMDO  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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金属-絶縁体-半導体構造【’81~’92】 
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