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J-GLOBAL ID:200902075110925826   Reference number:89A0230838

Determination of trace amounts of uranium and thorium in silicon and silicon dioxide by electrothermal vaporization/ICPMS.

電熱気化/誘導結合プラズマ質量分析法によるケイ素及び二酸化ケイ素中の超微量ウラン及びトリウムの定量
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Volume: 38  Issue:Page: T21-T25  Publication year: Feb. 1989 
JST Material Number: F0008A  ISSN: 0525-1931  CODEN: BNSKAK  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Physical analysis of elements in inorganic substances 
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