Art
J-GLOBAL ID：200902075120842414   Reference number：89A0079743

Infrared spectroscopy of thin silicon dioxide on silicon.

シリコン上の薄い二酸化けい素の赤外スペクトロスコピー
Author (2)：
OLSEN J E

About OLSEN J E

(North Carolina State Univ., NC, USA)

About North Carolina State Univ., NC, USA

, 
SHIMURA F

About SHIMURA F

(North Carolina State Univ., NC, USA)

About North Carolina State Univ., NC, USA


Material：
Applied Physics Letters  (Appl Phys Lett)

About Applied Physics Letters


Volume： 53  Issue： 20  Page： 1934-1936  Publication year： Nov. 14, 1988 
JST Material Number： H0613A  ISSN： 0003-6951  CODEN： APPLAB  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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silicon

About silicon

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Oxide thin films 
(BK14050P)

About Oxide thin films

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
シリコン

About シリコン

, 
二酸化けい素

About 二酸化けい素

, 
赤外スペクトロスコピー

About 赤外スペクトロスコピー


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