Art
J-GLOBAL ID:200902078774710370   Reference number:87A0011587

Leakage current mechanisms in hydrogen-passivated fine-grain polycrystalline silicon on insulator MOSFET’s.

SOI MOSFETにおける水素不動態化微粒子多結晶シリコンの漏れ電流機構
Author (2):
Material:
Volume: 33  Issue: 10  Page: 1518-1528  Publication year: Oct. 1986 
JST Material Number: C0222A  ISSN: 0018-9383  CODEN: IETDAI  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
Semi thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=87A0011587&from=J-GLOBAL&jstjournalNo=C0222A") }}
JST classification (1):
JST classification
Category name(code) classified by JST.
Transistors 

Return to Previous Page