Art
J-GLOBAL ID：200902085592254570   Reference number：89A0122997

Molecular beam epitaxy of silicon and related materials.

シリコン系分子線エピタキシー
Author (1)：
SHIRAKI YASUHIRO

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(東大 先端科技研セ)

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Material：
応用物理  (JSAP International)

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Volume： 57  Issue： 11  Page： 1620-1643  Publication year： Nov. 1988 
JST Material Number： F0252A  ISSN： 0369-8009  CODEN： OYBSA  Document type： Article
Article type： 文献レビュー  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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MBE growth

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,...
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Thesaurus term/Semi thesaurus term
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gas-source MBE

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Semiconductor thin films 
(BK14040E)

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Reference (121)：
  • 1) B. A. Unvala: Nature 194 (1962) 966.
  • 2) A. P. Hale: Vacuum 13 (1963) 93.
  • 3) Y. Nannichi: Nature 200 (1963) 1087.
  • 4) G. R. Booker and B. A. Unvala: Philos. Mag. 9 (1963) 1597.
  • 5) G. R. Booker and A. Howie: Appl. Phys. Lett. 3 (1963) 156.
ｍore...
Terms in the title (2)：
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シリコン

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, 
分子線エピタキシー

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