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J-GLOBAL ID:200902086423250988   Reference number:90A0157298

Enhancement in thermal oxidation of silicon by ozone.

シリコン熱酸化のオゾンによる増強
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Volume: 136  Issue:Page: 2751-2752  Publication year: Sep. 1989 
JST Material Number: C0285A  ISSN: 1945-7111  CODEN: JESOAN  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Oxide thin films  ,  Manufacturing technology of solid-state devices 
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