Art
J-GLOBAL ID：200902089152053374   Reference number：89A0599110

Deposition of H2-permselective SiO2 films.

H2選択透過性SiO2膜の蒸着
Author (3)：
GAVALAS G R

About GAVALAS G R

(California Inst. Technology, CA, USA)

About California Inst. Technology, CA, USA

, 
MEGIRIS C E

About MEGIRIS C E

(California Inst. Technology, CA, USA)

About California Inst. Technology, CA, USA

, 
NAM S W

About NAM S W

(California Inst. Technology, CA, USA)

About California Inst. Technology, CA, USA


Material：
Chemical Engineering Science  (Journal International de Genie Chimique)

About Chemical Engineering Science


Volume： 44  Issue： 9  Page： 1829-1835  Publication year： 1989 
JST Material Number： B0254A  ISSN： 0009-2509  Document type： Article
Article type： 原著論文  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
Hydrogen

About Hydrogen

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
silica

About silica


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JST classification (1)：
JST classification
Category name(code) classified by JST.
Membrane separation 
(XD02120Z)

About Membrane separation

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
H2

About H2

, 
選択透過性

About 選択透過性

, 
SiO2

About SiO2

, 
蒸着

About 蒸着


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