Significant improvement in depth resolution of Cr/Ni interfaces by secondary ion mass spectrometry profiling under normal O<sub>2</sub><sup>+</sup> ion bombardment.

KIM K J; MOON D W

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J-GLOBAL ID：200902090902069764 Reference number：92A0256315

Significant improvement in depth resolution of Cr/Ni interfaces by secondary ion mass spectrometry profiling under normal O₂⁺ ion bombardment.

二次イオン質量分析計による垂直入射のO₂⁺衝撃でのCr/Ni多層膜の深さ方向分布における界面の深さ方向分解能の著しい向上

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Volume： 60 Issue： 10 Page： 1178-1180 Publication year： Mar. 09, 1992
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Other methods of structure determination , Metallic thin films , Physical analysis of metals and alloys

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Significant improvement in depth resolution of Cr/Ni interfaces by secondary ion mass spectrometry profiling under normal O2+ ion bombardment.

Significant improvement in depth resolution of Cr/Ni interfaces by secondary ion mass spectrometry profiling under normal O₂⁺ ion bombardment.