Art
J-GLOBAL ID:200902093372212900   Reference number:88A0331373

Photo-resist material and process for Photo-Fabrication.

フォトファブリケーションのレジスト材料とプロセス
Author (1):
Material:
Volume: 25  Issue:Page: 133-143  Publication year: Apr. 1988 
JST Material Number: G0233A  ISSN: 0914-3319  CODEN: NIGAEV  Document type: Article
Article type: 解説  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=88A0331373&from=J-GLOBAL&jstjournalNo=G0233A") }}
JST classification (1):
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
Reference (47):
  • 1) 橋本貴夫: “図解・フォトファブリケーション” 総合電子出版社, pp. 15-238 (1986).
  • 2) 佐藤敏一: “金属エッチング技術” 槙書店, pp. 68-223 (1975).
  • 3) “印刷工学便覧” 日本印刷学会, 技報堂出版, pp. 1143-1164 (1983).
  • 4) 楢岡清威: “エレクトロニクスの精密微細加工” 総合電子出版社, pp. 64-133 (1983).
  • 5) 鳳紘一郎: “半導体リソグラフィ技術” 産業図書, pp. 1-14 (1986).
more...
Terms in the title (3):
Terms in the title
Keywords automatically extracted from the title.

Return to Previous Page