Art
J-GLOBAL ID：200902093970079203
Reference number：92A0684347
Nanometer patterning of InP using aerosol and plasma etching techniques.
エーロゾルおよびプラズマエッチング法によるInPのナノメートルパターン形成
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Author (4)：
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Material：
Volume：
61
Issue：
7
Page：
837-839
Publication year：
Aug. 17, 1992
JST Material Number：
H0613A
ISSN：
0003-6951
CODEN：
APPLAB
Document type：
Article
Article type：
短報
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Surface structure of semiconductors
, Techniques for samples
Terms in the title (3)：
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,
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