193nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives. The Interplay of the Chemical Structure of Components and Lithographic Properties.

HOULIHAN F M; TIMKO A; HUTTON R; CIRELLI R; KOMETANI J M; REICHMANIS E; NALAMASU O

Art

J-GLOBAL ID：200902100516479970 Reference number：99A0042857

193nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives. The Interplay of the Chemical Structure of Components and Lithographic Properties.

ポリ(ノルボルネン-alt-マレイン酸無水物)誘導体に基づく193nmの単層レジスト

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Material：
Issue： 706 Page： 191-207 Publication year： 1998
JST Material Number： H0588B ISSN： 0097-6156 Document type： Proceedings
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Other polymeric materials , Manufacturing technology of solid-state devices

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