Art
J-GLOBAL ID：200902101948849855   Reference number：99A0772256

Annealing behavior of thermal conductivity of disordered layer produced by ion implantation.

イオン打ち込みによる結晶破壊層の熱伝導率のアニール特性
Author (4)：
TAKABATAKE NOBUYA

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(神奈川工科大)

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, 
KOBAYASHI TAKESHI

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(神奈川工科大)

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, 
SHO YOSHIYUKI

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(電通大)

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, 
IZUMI TOMIO

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(東海大 工)

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Material：
電子情報通信学会技術研究報告  (IEICE Technical Report (Institute of Electronics, Information and Communication Engineers))

About 電子情報通信学会技術研究報告


Volume： 99  Issue： 167(US99 21-29)  Page： 19-22  Publication year： Jul. 09, 1999 
JST Material Number： S0532B  ISSN： 0913-5685  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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*photoacoustic spectroscopy

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,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
イオン打込み

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   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=99A0772256&from=J-GLOBAL&jstjournalNo=S0532B") }}
JST classification (1)：
JST classification
Category name(code) classified by JST.
Thin films in general 
(BK14010X)

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Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
イオン打ち込み

About イオン打ち込み

, 
結晶

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, 
破壊

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, 
熱伝導率

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, 
アニール

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