Art
J-GLOBAL ID：200902102143421162   Reference number：97A0730370

Formation mechanism of ultrathin WSiN barrier layer in a W/WNx/Si system.

W/WNx/Si系における超薄WSiN障壁層の形成機構
Author (6)：
NAKAJIMA K

About NAKAJIMA K

(Toshiba Corp., Kawasaki, JPN)

About Toshiba Corp., Kawasaki, JPN

, 
AKASAKA Y

About AKASAKA Y

(Toshiba Corp., Kawasaki, JPN)

About Toshiba Corp., Kawasaki, JPN

, 
MIYANO K

About MIYANO K

(Toshiba Corp., Kawasaki, JPN)

About Toshiba Corp., Kawasaki, JPN

, 
TAKAHASHI M

About TAKAHASHI M

(Toshiba Corp., Kawasaki, JPN)

About Toshiba Corp., Kawasaki, JPN

, 
SUEHIRO S

About SUEHIRO S

(Toshiba Corp., Kawasaki, JPN)

About Toshiba Corp., Kawasaki, JPN

, 
SUGURO K

About SUGURO K

(Toshiba Corp., Kawasaki, JPN)

About Toshiba Corp., Kawasaki, JPN


Material：
Applied Surface Science  (Appl Surf Sci)

About Applied Surface Science


Volume： 117/118  Page： 312-316  Publication year： Jun. 1997 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
nitride

About nitride

,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=97A0730370&from=J-GLOBAL&jstjournalNo=B0707B") }}
JST classification (2)：
JST classification
Category name(code) classified by JST.
Metallic thin films 
(BK14030T)

About Metallic thin films

,  Semiconductor integrated circuit 
(NC03162T)

About Semiconductor integrated circuit

Terms in the title (2)：
Terms in the title
Keywords automatically extracted from the title.
Si

About Si

, 
障壁層

About 障壁層


Return to Previous Page

TOP

BOTTOM