Art

J-GLOBAL ID：200902102395201424   Reference number：99A0289299

Self-assembled two-dimensional distribution of nanoparticles with high-current Cu^- implantation into insulators.

絶縁体への高電流Cu^-注入によるナノ粒子の自己集合二次元分布

Author (5)： KISHIMOTO N (National Res. Inst. Metals, Ibaraki, JPN) ,  UMEDA N (Univ. Tsukuba, Ibaraki, JPN) ,  TAKEDA Y (National Res. Inst. Metals, Ibaraki, JPN) ,  LEE C G (National Res. Inst. Metals, Ibaraki, JPN) ,  GRITSYNA V T (Kharkov State Univ., Kharkov, UKR)
Material： Nuclear Instruments & Methods in Physics Research. Section B. Beam Interactions with Materials and Atoms  (Nuclear Instruments and Methods in Physics Research. Section B. Beam Interactions with Materials and Atoms)
Volume： 148  Issue： 1/4  Page： 1017-1022  Publication year： Jan. 1999 
JST Material Number： H0899A  ISSN： 0168-583X  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *ion implantation ,...

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=99A0289299&from=J-GLOBAL&jstjournalNo=H0899A") }}

JST classification (1)： Irradiational changes of other materials  (BK16124V)

Terms in the title (6)： 絶縁体 ,  高電流 ,  注入 ,  ナノ粒子 ,  自己集合 ,  分布