Investigation of Pt/Ti bilayer metallization on silicon for ferroelectric thin film integration.

SREENIVAS K; REANEY I; MAEDER T; SETTER N; JAGADISH C; ELLIMAN R G

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J-GLOBAL ID：200902104493932936 Reference number：94A0139206

Investigation of Pt/Ti bilayer metallization on silicon for ferroelectric thin film integration.

強誘電性薄膜集積化のためのシリコン上Pt/Ti二層メタライゼーションの研究

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Volume： 75 Issue： 1 Page： 232-239 Publication year： Jan. 01, 1994
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Semiconductor-metal contacts

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