Metalorganic chemical vapor deposition of monocrystalline GaN thin films on β-LiGaO<sub>2</sub> substrates.

KUNG P; SAXLER A; ZHANG X; WALKER D; LAVADO R; RAZEGHI M

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J-GLOBAL ID：200902105512840580 Reference number：96A0898781

Metalorganic chemical vapor deposition of monocrystalline GaN thin films on β-LiGaO₂ substrates.

β-LiGaO₂基板上の単結晶GaN薄膜の有機金属化学蒸着

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Author (6)： , , , , ,
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Volume： 69 Issue： 14 Page： 2116-2118 Publication year： Sep. 30, 1996
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Semiconductor thin films

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Metalorganic chemical vapor deposition of monocrystalline GaN thin films on β-LiGaO2 substrates.

Metalorganic chemical vapor deposition of monocrystalline GaN thin films on β-LiGaO₂ substrates.