Evaluation of Cycloolefin-Maleic Anhydride Alternating Copolymers as Single-Layer Photoresists for 193nm Photolithography.

WALLOW T I; HOULIHAN F M; NALAMASU O; CHANDROSS E A; NEENAN T X; REICHMANIS E

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J-GLOBAL ID：200902105965518485 Reference number：96A0961269

Evaluation of Cycloolefin-Maleic Anhydride Alternating Copolymers as Single-Layer Photoresists for 193nm Photolithography.

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Author (6)： , , , , ,
Material：
Volume： 2724 Page： 355-364 Publication year： 1996
JST Material Number： D0943A ISSN： 0277-786X CODEN： PSISDG Document type： Proceedings
Country of issue： United States (USA) Language： ENGLISH (EN)

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