Behavior of silver in basic bath,electrodeposition of high purity copper from Cu(I) using cold molten salt.
常温型溶融塩を用いたCu(I)からの高純度銅の電析-塩基性浴における銀の挙動
Publisher site
{{ this.onShowPLink() }}
Copy service
{{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=96A0071520©=1") }}
Volume:
92nd
Page:
26
Publication year:
Sep. 1995
JST Material Number:
Y0050A
ISSN:
0917-2947
Document type:
Proceedings
Country of issue:
Japan (JPN)
Language:
JAPANESE (JA)
Terms in the title (9):
Terms in the title
Keywords automatically extracted from the title.