Art
J-GLOBAL ID:200902107961608512   Reference number:93A0320666

Computer Simulation of Plasma Etching. An Approach by Computer-aided Nonequilibrium Plasma Physics.

プラズマエッチングのコンピュータシミュレーション 計算(非平衡)プラズマ物理からのアプローチ
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Material:
Volume: 69  Issue:Page: 15-26  Publication year: Jan. 1993 
JST Material Number: G0114A  ISSN: 0918-7928  Document type: Article
Article type: 解説  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Applications of plasma 

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