Art
J-GLOBAL ID：200902111478731874   Reference number：99A0943038

Photolysis reaction mechanism of dibenzophenoneoxime hexamethylenediurethane, a new type of photobase generator.

新しいタイプの光塩基発生剤,ジベンゾフェノンオキシムヘキサメチレンジウレタンの光分解反応機構
Author (3)：
HWANG H

About HWANG H

(Seoul National Univ., Seoul, KOR)

About Seoul National Univ., Seoul, KOR

, 
JANG D-J

About JANG D-J

(Seoul National Univ., Seoul, KOR)

About Seoul National Univ., Seoul, KOR

, 
CHAE K H

About CHAE K H

(Chonnam National Univ., Chonnam, KOR)

About Chonnam National Univ., Chonnam, KOR


Material：
Journal of Photochemistry and Photobiology. A. Chemistry  (J Photochem Photobiol A Chem)

About Journal of Photochemistry and Photobiology. A. Chemistry


Volume： 126  Issue： 1/3  Page： 37-42  Publication year： Sep. 1999 
JST Material Number： D0721B  ISSN： 1010-6030  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
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*oxime ester

About oxime ester

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
crosslinking

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JST classification (1)：
JST classification
Category name(code) classified by JST.
Photochemical reaction,radical reaction 
(CF02090A)

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Substance index (1)：
Substance index
Chemical Substance indexed to the Article.
N,N′-Hexamethylenebis[(diphenylmethyleneaminooxy)formamide]

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Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
タイプ

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, 
光塩基発生剤

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, 
光分解反応

About 光分解反応


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