Art

J-GLOBAL ID：200902112804391562   Reference number：01A0758399

New Resin Systems for 157nm Lithography.

157nmリソグラフィー用の新しい樹脂のシステム

Author (9)： DAMMEL R R (Clariant Corp., NJ, USA) ,  SAKAMURI R (Clariant Corp., NJ, USA) ,  KUDO T (Clariant Corp., NJ, USA) ,  ROMANO A (Clariant Corp., NJ, USA) ,  RHODES L (B.F. Goodrich Corp., OH, USA) ,  VICARI R (B.F. Goodrich Corp., OH, USA) ,  HACKER C (B.F. Goodrich Corp., OH, USA) ,  CONLEY W (Intl. SEMATECH, TX, USA) ,  MILLER D (Intl. SEMATECH, TX, USA)
Material： Journal of Photopolymer Science and Technology  (フォトポリマー懇話会誌)
Volume： 14  Issue： 4  Page： 603-611  Publication year： 2001 
JST Material Number： L0202A  ISSN： 0914-9244  CODEN： JSTEEW  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *fluorine-containing polymer ,...
Semi thesaurus term： ポジティブ型レジスト

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JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Substance index (3)： α,α-Bis(trifluoromethyl)norborna-5-ene-2-ethanol ,  Norborn-5-ene-2-carboxylic acid tert-butyl ester ,  2-(Trifluoromethyl)norborna-5-ene-2-carboxylic acid tert-butyl ester

Reference (10)：

• 1) T.M Bloomstein, M.W. Horn,.M. Rothschild, R.R Kunz, S.T. Palmacci, and R.B. Goodman, J. Vac. Sci. Technol. B 15(6), 2112-2116 (1997); T.M. Bloomstein, M. Rothschild, R.R Kunz, D.E. Hardy, R.B. Goodman, and S.T. Palmacci, J. Vac. Sci. Technol. B 16(6), 3154-3157. (1998).
• 2) K. Patterson, M. Yamachika, R. Hung, C. Brodsky, S. Yamada, M. Somervell, B. Osborn, D. Hall, G. Dukovica, J. Byers, W. Conley, and C.G. Willson, Proc. SPIE 3999, 365 (2000); W. Conley et al., "Advancements in the research and development of photoresist materials for 157-nm imaging", presented at The First International Symposium on 157-nm Lithography, Dana Point, CA, May 2000, and references quoted.
• 3) M.K. Crawford, A.E. Feiring, J. Feldman, R.H. French, M. Periyasamy, F.L. Schadt III, R.J. Smalley, F.C. Zumsteg, R.R. Kunz, V. Rao, L. Liao, and S.M. Holl, Proc. SPIE 3999, 357 (2000)
• 4) H.V. Tran, S. Yamada, T. Chiba, R.J. Hung, B.C Trinque, C.J. Brodsky, W. Conley, and C.G. Willson , J. Photopolym. Sci. Technol., in print (2001); see also R. J. Hung, S. Yamada, B.C Trinque, T. Chiba, C.J. Brodsky, A Vander Heyden, H.V. Tran, M.J. Pinnow, P.I. Tattersall, T.S Jean, A. Jamieson, J.D. Byers, W. Conley, and C.G. Willson, Proc. SPIE 4345, in print (2001).
• 5) B. Goodall, S. Jayaraman, R. A. Shick, and L. F. Rhodes, PCT WO 97/33198 (B. F. Goodrich)

Terms in the title (1)： リソグラフィー