Art

J-GLOBAL ID：200902114490073318   Reference number：99A0399976

Synthesis and preliminary evaluation of substituted poly(norbornene sulfones) for 193NM lithography.

193nmリソグラフィー用の置換ポリ(ノルボルネンスルホン)の合成及び予備的評価

Author (3)： ITO H (IBM Almaden Res. Center, CA) ,  SEEHOF N (IBM Almaden Res. Center, CA) ,  SATO R (IBM Almaden Res. Center, CA)
Material： Polymeric Materials Science and Engineering  (Polymeric Materials: Science and Engineering)
Volume： 77  Page： 449-450  Publication year： 1997 
JST Material Number： B0886A  ISSN： 0743-0515  Document type： Article
Article type： 短報  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： *photoresist ,...
Semi thesaurus term： bridged compound

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JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Substance index (8)： Norbornene ,  Norborn-5-ene-2-carboxylic acid methyl ester ,  Norborna-2-ene-5-carboxylic acid 2-(oxiranyl)ethyl ester ,  Norborn-5-ene-2-carboxylic acid 2-hydroxyethyl ester ,  Norborn-5-ene-2-carboxylic acid tert-butyl ester ,  Norborn-5-ene-2-carboxylic acid ,  Norborna-2-ene-5-carboxylic acid 3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propyl ester ,  Norborna-2-ene-5-carboxylic acid 3,3,3-trifluoro-2-(trifluoromethyl)-2-(tert-butyloxycarbonyloxy)propyl ester

Terms in the title (3)： リソグラフィー ,  置換 ,  評価