Art
J-GLOBAL ID：200902119165363956   Reference number：96A1018948

Effect of fluorine on dielectric properties of SiOF films.

SiOF膜の誘電特性に及ぼすふっ素の効果
Author (2)：
LEE S

About LEE S

(Honyang Univ., Seoul, KOR)

About Honyang Univ., Seoul, KOR

, 
PARK J-W

About PARK J-W

(Honyang Univ., Seoul, KOR)

About Honyang Univ., Seoul, KOR


Material：
Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)

About Journal of Applied Physics


Volume： 80  Issue： 9  Page： 5260-5263  Publication year： Nov. 01, 1996 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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silicon fluoride

About silicon fluoride

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Dielectrics in general 
(BM05010F)

About Dielectrics in general

,  Thin films of other inorganic compounds 
(BK14060A)

About Thin films of other inorganic compounds

Terms in the title (2)：
Terms in the title
Keywords automatically extracted from the title.
誘電特性

About 誘電特性

, 
ふっ素

About ふっ素


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