Preliminary results from a prototype projection electron-beam stepper-scattering with angular limitation projection electron beam lithography proof-of-concept system.

HARRIOTT L R; BRADY K; CONNELLY W F; DIMARCO R; HOPKINS L; KRAUS J S; PEABODY M L; WERDER K S; WINDT D

Art

J-GLOBAL ID：200902119904105227 Reference number：97A0194299

Preliminary results from a prototype projection electron-beam stepper-scattering with angular limitation projection electron beam lithography proof-of-concept system.

角度制限型の投影電子ビームリソグラフィー概念証明システムを用いた原型投影電子ビームステッパ散乱の予備的結果

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Material：
Volume： 14 Issue： 6 Page： 3825-3828 Publication year： Nov. 1996
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Particle optics in general , Manufacturing technology of solid-state devices

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