Art
J-GLOBAL ID：200902120051478921
Reference number：94A0657304
Growth of thin films with preferential crystallographic orientation by ion bombardment during deposition.
蒸着の際のイオン衝撃による優先的結晶配向性を持つ薄膜の成長
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Author (1)：
Material：
Volume：
65
Issue：
1/3
Page：
90-105
Publication year：
Jul. 1994
JST Material Number：
D0205C
ISSN：
0257-8972
Document type：
Article
Article type：
原著論文
Country of issue：
Netherlands (NLD)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Thin films of other inorganic compounds
Terms in the title (6)：
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