Evaluation of Self-Patterned PbZrxTi1-xO3 Thin Film from Photosensitive Solution.

UOZUMI G; KAGEYAMA K; ATSUKI T; SOYAMA N; UCHIDA H; OGI K

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J-GLOBAL ID：200902122729749516 Reference number：99A0999504

Evaluation of Self-Patterned PbZr_xTi_1-xO₃ Thin Film from Photosensitive Solution.

感光性溶液から自己パターン化したPbZr_xTi_1-xO₃薄膜の評価

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Material：
Volume： 38 Issue： 9B Page： 5350-5353 Publication year： Sep. 30, 1999
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Ferroelectrics,antiferroelectrics and ferroelasticity , Manufacturing technology of solid-state devices

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4) N. Soyama, H. Uchida, K. Kageyama, K. Ogi, M. C. Scott, J. D. Cuchiaro, G. F. Derbenwick, L. D. Mcmillan and C. A. Paz de Araujo: Mater. Res. Soc. Symp. Proc. 433 (1996) 91.
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