Fabrication of ultralow-loss Si/SiO<sub>2</sub> waveguides by roughness reduction.

LEE K K; LIM D R; KIMERLING L C; SHIN J; CERRINA F

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J-GLOBAL ID：200902123187086821 Reference number：02A0073374

Fabrication of ultralow-loss Si/SiO₂ waveguides by roughness reduction.

粗さを減少させた超低損失Si/SiO₂導波路の製作

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Author (5)： , , , ,
Material：
Volume： 26 Issue： 23 Page： 1888-1890 Publication year： Dec. 01, 2001
JST Material Number： H0690A ISSN： 0146-9592 CODEN： OPLEDP Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Optical waveguide,optical fibers,and fiber optics

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Fabrication of ultralow-loss Si/SiO2 waveguides by roughness reduction.

Fabrication of ultralow-loss Si/SiO₂ waveguides by roughness reduction.