Art
J-GLOBAL ID：200902123220071240   Reference number：94A0916634

Preparation of Copper Films by the Two-Liquid-lnterface Electrodeposition.

二液相界面における電析による銅薄膜の製造
Author (3)：
KANEKO HIROYUKI

About KANEKO HIROYUKI

(秋田大 鉱山)

About 秋田大 鉱山

, 
TAIMATSU HITOSHI

About TAIMATSU HITOSHI

(秋田大 鉱山)

About 秋田大 鉱山

, 
OTSUKI EIJI

About OTSUKI EIJI

(秋田大 鉱山)

About 秋田大 鉱山


Material：
伸銅技術研究会誌  (Journal of the Japan Copper and Brass Research Association)

About 伸銅技術研究会誌


Volume： 33  Page： 175-181  Publication year： Sep. 1994 
JST Material Number： S0603A  ISSN： 0370-985X  Document type： Proceedings
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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electrodeposition

About electrodeposition

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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heptane

About heptane


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JST classification (2)：
JST classification
Category name(code) classified by JST.
Metallic thin films 
(BK14030T)

About Metallic thin films

,  Electrochemical reaction 
(CB07050F)

About Electrochemical reaction

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
二液

About 二液

, 
相界面

About 相界面

, 
電析

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, 
銅薄膜

About 銅薄膜


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