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J-GLOBAL ID:200902123249205385   Reference number:99A0341517

Processing and characterization of alumina thin films on chemically vapor deposited diamond substrates for producing adherent metallizations.

付着力のあるメタライゼーションを得るための化学蒸着ダイヤモンド基板へのアルミナ薄膜の作製とキャラクタリゼーション
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Volume: 14  Issue:Page: 565-577  Publication year: Feb. 1999 
JST Material Number: D0987B  ISSN: 0884-2914  CODEN: JMREEE  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Semiconductor thin films  ,  Materials of solid-state devices 

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