Art
J-GLOBAL ID：200902125566231920   Reference number：01A0911036

Nondestructive Depth Analysis of Thin Films on Silicon Substrates using Soft X-Ray Emission Spectroscopy.

薄膜/シリコン基板の軟X線発光分光法による非破壊深さ分析
Author (1)：
NAKAMURA HATSUO

About NAKAMURA HATSUO

(大阪電通大)

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Material：
大阪電気通信大学研究論集 自然科学編  (Memoirs of Osaka Electro-Communication University. Natural Science)

About 大阪電気通信大学研究論集 自然科学編


Issue： 35  Page： 45-57  Publication year： May. 31, 2000 
JST Material Number： G0383A  ISSN： 0386-4987  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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*depth analysis

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JST classification (3)：
JST classification
Category name(code) classified by JST.
Electron spectroscopy 
(BM09060K)

About Electron spectroscopy

,  Techniques and equipment of thin film deposition 
(BK14020I)

About Techniques and equipment of thin film deposition

,  Measuring instruments in general 
(AD02000X)

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Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
薄膜

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, 
シリコン基板

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, 
軟X線発光分光法

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, 
深さ分析

About 深さ分析


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