Art
J-GLOBAL ID：200902126566735518
Reference number：02A0186758
Precipitation-enhanced diffusion of nickel in dislocation-free silicon studied by in-diffusion and annealing processes.
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Author (3)：
,
,
Material：
Volume：
308/310
Page：
427-430
Publication year：
Dec. 2001
JST Material Number：
H0676B
ISSN：
0921-4526
Document type：
Article
Country of issue：
Netherlands (NLD)
Language：
ENGLISH (EN)
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