Art
J-GLOBAL ID：200902126883051918   Reference number：94A0432124

Improvement of Reactive Etching System.

リアクティブ・エッチング装置の改良
Author (2)：
ISHII KOICHI

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(木更津工高専)

About 木更津工高専

, 
KODAIRA SHINJI

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(木更津工高専)

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Material：
木更津工業高等専門学校紀要  (Bulletin of Kisarazu National Technical College)

About 木更津工業高等専門学校紀要


Issue： 27  Page： 19-22  Publication year： Mar. 1994 
JST Material Number： S0774A  ISSN： 0285-7901  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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RIE

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,...
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diffusion pump

About diffusion pump


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JST classification (2)：
JST classification
Category name(code) classified by JST.
Applications of plasma 
(BJ02110K)

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,  Manufacturing technology of solid-state devices 
(NC03030V)

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