Fabrication and Characterization of Epitaxial TiO<sub>2</sub> Thin Films on Sapphire Substrates by Pulsed Laser Deposition.

SHINOHARA RYUJI; YAMAKI TETSUYA; SUMITA TAISHI; YAMAMOTO SHUN'YA; MIYASHITA ATSUMI; ITO HISAYOSHI; ASAI KEISUKE

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J-GLOBAL ID：200902128884771933 Reference number：01A0843705

Fabrication and Characterization of Epitaxial TiO₂ Thin Films on Sapphire Substrates by Pulsed Laser Deposition.

レーザアブレーション法によるサファイア基板上へのエピタキシャルTiO₂薄膜の作製と評価

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Author (7)： , , , , , ,
Material：
Volume： 79th Issue： 1 Page： 291 Publication year： Mar. 15, 2001
JST Material Number： S0493A ISSN： 0285-7626 Document type： Proceedings
Article type：短報 Country of issue： Japan (JPN) Language： JAPANESE (JA)

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Oxide thin films

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Fabrication and Characterization of Epitaxial TiO2 Thin Films on Sapphire Substrates by Pulsed Laser Deposition.

Fabrication and Characterization of Epitaxial TiO₂ Thin Films on Sapphire Substrates by Pulsed Laser Deposition.