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J-GLOBAL ID:200902132838961156   Reference number:93A0912179

Phase transformation mechanisms involved in excimer laser crystallization of amorphous silicon films.

非晶質シリコン膜のエキシマレーザ結晶化における相転移機構
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Material:
Volume: 63  Issue: 14  Page: 1969-1971  Publication year: Oct. 04, 1993 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Semiconductor thin films  ,  Laser irradiation effects and damages 
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