Art
J-GLOBAL ID：200902135653756415
Reference number：99A0972909
Clean Technology Supporting Semiconductor Manufacturing Process. Ultrapure Water. Production, Analysis and Functional Water.
半導体プロセスを支えるクリーン化技術 超純水技術 製造・分析技術と機能水
Author (1)：
Material：
Volume：
50
Issue：
10
Page：
873-878
Publication year：
Oct. 01, 1999
JST Material Number：
G0441B
ISSN：
0915-1869
CODEN：
HYGIEX
Document type：
Article
Article type：
解説
Country of issue：
Japan (JPN)
Language：
JAPANESE (JA)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Solic-state devices in general
Reference (11)：
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FULDE, T. Ultrapure Water. 1999, 47
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横井生憲. 半導体テクノロジー大全, 第6章, 電子ジャーナル. 1997, 457
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MORITA, M. J. Applied Physics. 1990, 68, 1272
-
小泉求. ウルトラクリーンテクノロジー. 1993, 5, 1, 62
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OINUMA, M. Water Proc. of Semiconductor Pure Water and Chemicals Conference. 1993, 180
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