Art
J-GLOBAL ID:200902136521663511   Reference number:98A0739751

Improved high-temperature stability of Si incorporated a-C:H films.

Siを導入したa-C:H膜の高温安定性の向上
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Material:
Volume:Issue:Page: 1155-1162  Publication year: Aug. 1998 
JST Material Number: W0498A  ISSN: 0925-9635  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Semiconductor thin films 
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