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J-GLOBAL ID：200902137999132690   Reference number：03A0016002

Preparation of BN Films by Reactive RF Ion Plating Method.

反応性RFイオンプレーティング法によるBN皮膜の形成
Author (4)：
SATO TADAO

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(室蘭工大)

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, 
WAKAYANAGI SHUN'ICHI

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(室蘭工大 大学院)

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, 
WATANABE TAKAYUKI

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(室蘭工大 大学院)

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, 
SAKAI AKIRA

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(室蘭工大)

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Material：
室蘭工業大学紀要  (Memoirs of the Muroran institute of Technology)

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Issue： 52  Page： 149-154  Publication year： Nov. 30, 2002 
JST Material Number： F0480A  ISSN： 1344-2708  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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thin film growth

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,...
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electron probe microanalysis

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Thin films of other inorganic compounds 
(BK14060A)

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Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
反応性

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, 
RF

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, 
イオンプレーティング法

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, 
BN

About BN

, 
皮膜

About 皮膜


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