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J-GLOBAL ID:200902138393423106   Reference number:96A0068992

Use of low-temperature processing to deposit low-resistivity ITO films.

低比抵抗ITOの低温成膜
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Volume: 64  Issue: 12  Page: 1225-1229  Publication year: Dec. 1995 
JST Material Number: F0252A  ISSN: 0369-8009  CODEN: OYBSA  Document type: Article
Article type: 解説  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Oxide thin films 
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