Nitrogen Plasma Doping during Metalorganic Chemical Vapor Deposition of ZnSe.

MORIMOTO K; KAWAMURA Y; INOUE N

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J-GLOBAL ID：200902138944343524 Reference number：97A0823510

Nitrogen Plasma Doping during Metalorganic Chemical Vapor Deposition of ZnSe.

ZnSeの有機金属化学蒸着中の窒素プラズマドーピング

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Material：
Volume： 36 Issue： 7B Page： 4949-4952 Publication year： Jul. 1997
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Semiconductor thin films

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