In situ chamber cleaning using atomic H in catalytic-CVD apparatus for mass production of a-Si:H solar cells.

MASUDA A; ISHIBASHI Y; UCHIDA K; KAMESAKI K; IZUMI A; MATSUMURA H

Art

J-GLOBAL ID：200902139207951498 Reference number：02A0754374

In situ chamber cleaning using atomic H in catalytic-CVD apparatus for mass production of a-Si:H solar cells.

a-Si:H太陽電池の大量生産用触媒CVD装置内の原子Hを用いたその場チャンバークリーニング

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Material：
Volume： 74 Issue： 1/4 Page： 373-377 Publication year： Oct. 2002
JST Material Number： D0513C ISSN： 0927-0248 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Techniques and equipment of thin film deposition

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