Etch characteristics of HfO<sub>2</sub> films on Si substrates.

NORASETTHEKUL S; PARK P Y; BAIK K H; LEE K P; SHIN J H; JEONG B S; SHISHODIA V; NORTON D P; PEARTON S J

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J-GLOBAL ID：200902146587535927 Reference number：02A0372797

Etch characteristics of HfO₂ films on Si substrates.

Si基板上のHfO₂膜のエッチング特性

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Volume： 187 Issue： 1/2 Page： 75-81 Publication year： Feb. 14, 2002
JST Material Number： B0707B ISSN： 0169-4332 Document type： Article
Article type：原著論文 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Applications of plasma , Manufacturing technology of solid-state devices

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Etch characteristics of HfO2 films on Si substrates.

Etch characteristics of HfO₂ films on Si substrates.