Design Strategies for 157nm Single-Layer Photoresists: Lithographic Evaluation of a Poly(α-trifluoromethyl vinyl alcohol) Copolymer.

SCHMALJOHANN D; BAE Y C; WEIBEL G L; HAMAD A H; OBER C K

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J-GLOBAL ID：200902147487310363 Reference number：00A0908572

Design Strategies for 157nm Single-Layer Photoresists: Lithographic Evaluation of a Poly(α-trifluoromethyl vinyl alcohol) Copolymer.

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Author (5)： , , , ,
Material：
Volume： 3999 Issue： Pt.1 Page： 330-334 Publication year： 2000
JST Material Number： D0943A ISSN： 0277-786X CODEN： PSISDG Document type： Proceedings
Country of issue： United States (USA) Language： ENGLISH (EN)

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