Electron holographic characterization of electrostatic potential distributions in a transistor sample fabricated by focused ion beam.

WANG Z; HIRAYAMA T; SASAKI K; SAKA H; KATO N

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J-GLOBAL ID：200902147739494870 Reference number：02A0146723

Electron holographic characterization of electrostatic potential distributions in a transistor sample fabricated by focused ion beam.

集束イオンビームで作製したトランジスタにおける静電ポテンシャル分布の電子ホログラフィー評価

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Author (5)： , , , ,
Material：
Volume： 80 Issue： 2 Page： 246-248 Publication year： Jan. 14, 2002
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Metal-insulator-semiconductor structures , Transistors

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