Art
J-GLOBAL ID：200902150036459690
Reference number：95A0447921
Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors.
低温CMOS薄膜トランジスタに対するAs堆積の多結晶シリコン膜の応用
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Author (5)：
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Material：
Volume：
34
Issue：
2B
Page：
921-926
Publication year：
Feb. 1995
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Transistors
Reference (13)：
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INOUE, S. 1991 Int. Electron Devices Meet. Tech. Dig. 1991, 555
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LITTLE, T. W. J. Soc. Inf. Display. 1993, 1/2, 203
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OHSHIMA, H. 1993 Soc. Inf. Display Dig. 1993, 387
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SERA, K. Ext. Abstr.1991 Int. Conf. Solid State Devices and Materials. 1991, 590
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YAMAMOTO, S. Proc.12 Int. Display Research Conf., Japan Display'92. 1992, 565
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